Title:
COATING COMPOSITION FOR PATTERN REVERSAL ON SOC PATTERN
Document Type and Number:
WIPO Patent Application WO/2016/031563
Kind Code:
A1
Abstract:
[Problem] To provide a resin composition, used for pattern reversal, that forms a flat film and can be made to suitably fill spaces in a pattern in a substrate that has height differences and is formed on top of a substrate being processed. [Solution] A polysiloxane coating composition used in the following steps: a step (1) in which an organic underlayer film 3 is formed on a semiconductor substrate 2; a step (2) in which a silicon-hard-mask-forming composition is applied on top of the organic underlayer film 3 and baked, forming a silicon hard mask 4; a step (3) in which a resist composition is applied on top of said silicon hard mask, forming a resist film 5; a step (4) in which said resist film 5 is exposed and then developed, yielding a resist pattern; a step (5) in which the silicon hard mask 4 is etched; a step (6) in which the organic underlayer film 3 is etched; a step (7a, 7b) in which this polysiloxane coating composition is applied on top of the patterned organic underlayer film 3 and etched back so as to expose the top surface of the organic underlayer film; and a step (8) in which the organic underlayer film 3 is etched, thereby reversing the pattern.
Inventors:
YAGUCHI HIROAKI (JP)
NAKAJIMA MAKOTO (JP)
SHIBAYAMA WATARU (JP)
TAKEDA SATOSHI (JP)
WAKAYAMA HIROYUKI (JP)
SAKAMOTO RIKIMARU (JP)
NAKAJIMA MAKOTO (JP)
SHIBAYAMA WATARU (JP)
TAKEDA SATOSHI (JP)
WAKAYAMA HIROYUKI (JP)
SAKAMOTO RIKIMARU (JP)
Application Number:
PCT/JP2015/072770
Publication Date:
March 03, 2016
Filing Date:
August 11, 2015
Export Citation:
Assignee:
NISSAN CHEMICAL IND LTD (JP)
International Classes:
G03F7/26; G03F7/40; H01L21/027
Domestic Patent References:
| WO2010010928A1 | 2010-01-28 | |||
| WO2010123032A1 | 2010-10-28 | |||
| WO2012132686A1 | 2012-10-04 |
Foreign References:
| JP2008216530A | 2008-09-18 | |||
| US20140234785A1 | 2014-08-21 | |||
| JP2010169894A | 2010-08-05 | |||
| JP2009301007A | 2009-12-24 | |||
| US20120126358A1 | 2012-05-24 | |||
| JP2004363371A | 2004-12-24 |
Attorney, Agent or Firm:
HANABUSA PATENT & TRADEMARK OFFICE (JP)
A patent business corporation is a なぶさ patent trademark office. (JP)
A patent business corporation is a なぶさ patent trademark office. (JP)
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