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Patent Searching and Data


Title:
COATING COMPOSITION AND SILICON RESIN COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2011/089970
Kind Code:
A1
Abstract:
Disclosed is a coating composition which is capable of forming a coating film that exhibits a shielding effect up until the UV-A region, has an unprecedented light resistance, and does not deteriorate over time. The coating composition is characterized by containing a binder component and and a compound represented by general formula (1). [In the formula, R1a, R1b, R1c, R1d and R1e independently represent hydrogen atoms, or monovalent substituents excluding hydroxy groups, and at least one of the substituents represents a substituent having a Hammett σp value which is positive. The substituents may bond to one another to form rings. R1g, R1h,R1i,R1j,R1k,R1m,R1n, and R1p independently represent hydrogen atoms or monovalent substituents. The substituents may bond to one another to form rings.]

Inventors:
AMASAKI Ichiro (())
尼崎 一路 (())
KIMURA Keizo (())
木村 桂三 (())
Application Number:
JP2011/050489
Publication Date:
July 28, 2011
Filing Date:
January 13, 2011
Export Citation:
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Assignee:
FUJIFILM Corporation (26-30, Nishiazabu 2-chome Minato-k, Tokyo 31, 〒1060031, JP)
富士フイルム株式会社 (〒31 東京都港区西麻布2丁目26番30号 Tokyo, 〒1060031, JP)
AMASAKI Ichiro (())
尼崎 一路 (())
KIMURA Keizo (())
International Classes:
C09D201/00; C07D251/24; C09D7/12; C09D183/04
Attorney, Agent or Firm:
TAKAMATSU Takeshi et al. (Koh-Ei Patent Firm, Toranomon East Bldg. 9F7-13, Nishi-Shimbashi 1-chom, Minato-ku Tokyo 03, 〒1050003, JP)
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Claims: