Title:
COATING DEVICE AND COATING METHOD THEREOF
Document Type and Number:
WIPO Patent Application WO/2021/248865
Kind Code:
A1
Abstract:
A coating device and a coating method. The coating apparatus comprises a reaction chamber (10), a support frame (40), a single release source (20), and a plasma excitation source (30). The support frame (40) comprises a support area (411) for supporting a base material (90). The single release source (20) comprises a release inlet (21) for leading out a film layer forming material (201) into the reaction chamber (11). The plasma excitation source (30) is disposed for activating the film layer forming material (201), wherein the support area (411) of the support frame (40) is located between the single release source (20) and the plasma excitation source (30), so that the film layer is uniformly formed on the surface of the base material, and the deposition speed is increased.
Inventors:
ZONG JIAN (CN)
Application Number:
PCT/CN2020/137120
Publication Date:
December 16, 2021
Filing Date:
February 26, 2021
Export Citation:
Assignee:
JIANGSU FAVORED NANOTECHNOLOGY CO LTD (CN)
International Classes:
C23C16/513
Domestic Patent References:
| WO1997038801A1 | 1997-10-23 | |||
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| WO1999064662A1 | 1999-12-16 | |||
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Foreign References:
| US6177147B1 | 2001-01-23 | |||
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Other References:
WANG ET AL., CHEM MATER, 1996, pages 2212 - 2214
See also references of EP 4163418A4
See also references of EP 4163418A4
Attorney, Agent or Firm:
UNITALEN ATTORNEYS AT LAW (CN)
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