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Title:
COATING LIQUID FOR FORMING DIFFUSION PREVENTION LAYER, METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE WITH DOPANT DIFFUSION LAYER USING SAME, AND METHOD FOR MANUFACTURING SOLAR CELL
Document Type and Number:
WIPO Patent Application WO/2013/111840
Kind Code:
A1
Abstract:
A coating liquid for forming diffusion prevention layers, which is applied to the surface of a semiconductor substrate for the purpose of preventing diffusion of a dopant, and which contains a polyvinyl alcohol resin (component (A)) and fine metal oxide particles (component (B)). Consequently, there can be provided: a coating liquid for forming diffusion prevention layers, which is highly uniform in diffusion prevention performance and has excellent coating film formability by screen printing or the like; a method for producing a semiconductor substrate with a dopant diffusion layer, said method using the coating liquid for forming diffusion prevention layers; and a method for manufacturing a solar cell.

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Inventors:
KATSUMA KATSUHIKO (JP)
SATO HIROAKI (JP)
KATO KUNIYASU (JP)
TSUTSUMI YUKA (JP)
Application Number:
PCT/JP2013/051529
Publication Date:
August 01, 2013
Filing Date:
January 25, 2013
Export Citation:
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Assignee:
NIPPON SYNTHETIC CHEM IND (JP)
International Classes:
H01L21/22; H01L31/04
Domestic Patent References:
WO2011132744A12011-10-27
WO2010101054A12010-09-10
WO2007020833A12007-02-22
Foreign References:
JP2011035252A2011-02-17
JP2011029553A2011-02-10
Attorney, Agent or Firm:
SAITOH Yukihiko et al. (JP)
Masahiko Nishifuji (JP)
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