Title:
COATING LIQUID TO BE APPLIED OVER RESIST PATTERN AND METHOD FOR FORMING REVERSE PATTERN
Document Type and Number:
WIPO Patent Application WO/2015/025665
Kind Code:
A1
Abstract:
[Problem] To provide a coating liquid which is applied over a resist pattern and is used in place of a conventional rinsing liquid.
[Solution] A coating liquid to be applied over a resist pattern, which contains: a polymer that has a weight average molecular weight of 500-3,500 and comprises a structural unit represented by formula (1) and a structural unit represented by formula (2); and a solvent that is mainly composed of water.
(In the formulae, R1 represents an organic group having 1-8 carbon atoms.)
Inventors:
SAKAIDA YASUSHI (JP)
SAKAMOTO RIKIMARU (JP)
SHIGAKI SHUHEI (JP)
SAKAMOTO RIKIMARU (JP)
SHIGAKI SHUHEI (JP)
Application Number:
PCT/JP2014/069341
Publication Date:
February 26, 2015
Filing Date:
July 22, 2014
Export Citation:
Assignee:
NISSAN CHEMICAL IND LTD (JP)
International Classes:
G03F7/40; G03F7/32; H01L21/027
Domestic Patent References:
| WO2010123032A1 | 2010-10-28 | |||
| WO2012128251A1 | 2012-09-27 |
Foreign References:
| JP2010020109A | 2010-01-28 | |||
| JP2001343757A | 2001-12-14 | |||
| JP2002110510A | 2002-04-12 | |||
| JP2007019161A | 2007-01-25 | |||
| JP2005277052A | 2005-10-06 | |||
| JP2004205699A | 2004-07-22 |
Other References:
RIKIMARU SAKAMOTO ET AL.: "Dry Development Rinse Process(DDRP) and Material(DDRM) for Novel pattern collapse free process", PROCEEDINGS OF SPIE, vol. 8682, 29 March 2013 (2013-03-29), pages 868205
Attorney, Agent or Firm:
HANABUSA, Tsuneo et al. (JP)
Sepal Tsuneo (JP)
Sepal Tsuneo (JP)
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