Title:
COATING METHOD FOR FORMING HMDSO LAYER AND AF LAYER TOGETHER ON ALUMINUM METAL LAYER AND FORMING HMDSO LAYER AND AF LAYER TOGETHER ON ALUMINUM METAL LAYER USING ION SOURCE
Document Type and Number:
WIPO Patent Application WO/2016/076673
Kind Code:
A1
Abstract:
The present invention relates to a coating method for forming an HMDSO layer and an AF layer together on an aluminum metal layer. An HMDSO layer and an AF layer are sequentially formed on an aluminum metal material of a smart phone by a CVD method in a vacuum chamber. Therefore, the present invention has remarkable effects, such as fast operating time, increasing bonding force of the AF layer coated on the aluminum metal layer of the smart phone, excellent wear resistance and salt water resistance, and flawlessness. The present invention relates to a coating method for forming an HMDSO layer and an AF layer together on an aluminum metal layer using an ion source. An HMDSO layer and an AF layer are sequentially formed on an aluminum metal material of a smart phone by a PECVD method in a vacuum chamber. Therefore, the present invention has remarkable effects, such as fast operating time, increasing bonding force of the AF layer coated on the aluminum metal layer, excellent wear resistance and salt water resistance, and flawlessness, due to the installation of the ion source.
Inventors:
YOO HEUNG SANG (KR)
Application Number:
PCT/KR2015/012256
Publication Date:
May 19, 2016
Filing Date:
November 13, 2015
Export Citation:
Assignee:
YOO HEUNG SANG (KR)
International Classes:
C23C28/00; C23C16/00; C23C16/50
Foreign References:
| KR20120108254A | 2012-10-05 | |||
| KR20130116431A | 2013-10-24 | |||
| KR20120130468A | 2012-12-03 | |||
| KR20030030755A | 2003-04-18 | |||
| KR20120084356A | 2012-07-30 |
Attorney, Agent or Firm:
KIM, Seok Kea (KR)
김석계 (KR)
김석계 (KR)
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