Title:
COATING PROCESS METHOD, COMPUTER STORAGE MEDIUM, AND COATING PROCESS DEVICE
Document Type and Number:
WIPO Patent Application WO/2018/116745
Kind Code:
A1
Abstract:
A method for coating a coating liquid onto a substrate is provided, wherein said method comprises: supplying, before a liquid film of coating liquid formed on the substrate becomes dried, a solvent for the coating liquid to a peripheral portion of the liquid film of the coating liquid on the substrate while the substrate is rotated at a predetermined rotational speed, thereby forming a mixed layer of the coating liquid and the solvent in the peripheral portion; and, thereafter, rotating the substrate at a rotational speed higher than the predetermined rotational speed to move the mixed layer toward the periphery, thereby controlling the film thickness of the coating liquid after drying.
Inventors:
INABA SHOGO (JP)
YOSHIHARA KOSUKE (JP)
HATAKEYAMA SHINICHI (JP)
YOSHIHARA KOSUKE (JP)
HATAKEYAMA SHINICHI (JP)
Application Number:
PCT/JP2017/042266
Publication Date:
June 28, 2018
Filing Date:
November 24, 2017
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H01L21/027; B05C11/08; B05D1/36; B05D1/40; B05D3/00
Foreign References:
| JPH06210230A | 1994-08-02 | |||
| JP2010212658A | 2010-09-24 | |||
| JP2007299941A | 2007-11-15 | |||
| JP2003249436A | 2003-09-05 | |||
| JP2003136010A | 2003-05-13 | |||
| JP2002361167A | 2002-12-17 |
Attorney, Agent or Firm:
KANEMOTO, Tetsuo et al. (JP)
Download PDF: