Title:
COLORED FILM, METHOD FOR MANUFACTURING SAME, AND SOLID-STATE IMAGING ELEMENT
Document Type and Number:
WIPO Patent Application WO/2018/180477
Kind Code:
A1
Abstract:
Provided are a colored film that exhibits excellent light resistance and very low reflectance, a method for manufacturing the colored film, and a solid-state imaging element. This colored film has an uneven structure on the surface, wherein the average distance between adjacent projections in the uneven structure is 1500 nm or less, the standard deviation of the distance between adjacent projections is 10-300 nm, and 95.00% or more of the projections satisfy formula (1): 3h/D≥1.0, where h represents the height of a projection, and D represents the average distance between adjacent projections.
Inventors:
HAMADA DAISUKE (JP)
Application Number:
PCT/JP2018/009854
Publication Date:
October 04, 2018
Filing Date:
March 14, 2018
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
G02B5/22; G02B1/118; G02B5/00; G02B5/20; G03F7/004; G03F7/039; H01L27/146; H01L27/144
Domestic Patent References:
| WO2015133431A1 | 2015-09-11 | |||
| WO2016158114A1 | 2016-10-06 |
Foreign References:
| JP2016091941A | 2016-05-23 | |||
| JP2005076127A | 2005-03-24 | |||
| JP2012208391A | 2012-10-25 | |||
| JP2015018178A | 2015-01-29 | |||
| JP2009276700A | 2009-11-26 | |||
| JP2003156849A | 2003-05-30 |
Attorney, Agent or Firm:
NAKASHIMA Junko et al. (JP)
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