COMPONENT AND SEMICONDUCTOR MANUFACTURING DEVICE

Title:

COMPONENT AND SEMICONDUCTOR MANUFACTURING DEVICE

Document Type and Number:

WIPO Patent Application WO/2019/026818

Kind Code:

A1

Abstract:

The component according to the present invention is provided with a film having polycrystalline yttrium oxide. In an X-ray diffraction pattern of the film, the ratio Im/Ic of the maximum intensity Im of peaks pertaining to monoclinic yttrium oxide to the maximum intensity Ic of peaks pertaining to cubic yttrium oxide satisfies the expression: 0 ≤ Im/Ic ≤ 0.002.

Inventors:

HINO TAKASHI (JP)
INOUE TETSUO (JP)
SAITO SHUICHI (JP)

Application Number:

PCT/JP2018/028376

Publication Date:

February 07, 2019

Filing Date:

July 30, 2018

Export Citation:

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Assignee:

TOSHIBA KK (JP)
TOSHIBA MATERIALS CO LTD (JP)

International Classes:

C23C14/08; C23C8/12; C23C14/34; H01L21/3065

Foreign References:

JP2009287058A	2009-12-10
JP2000256844A	2000-09-19
CN101117702A	2008-02-06
JPH09102272A	1997-04-15
JP2012191200A	2012-10-04