Title:
COMPOSITE SLIDING STRUCTURE INCLUDING, ON BASE SUBSTANCE, SEGMENT STRUCTURE HARD FILM AND SOLID LUBRICATION LAYER OR FLUID-LIKE LUBRICATION LAYER, AND METHOD OF PRODUCING THEM
Document Type and Number:
WIPO Patent Application WO/2006/095907
Kind Code:
A1
Abstract:
A composite sliding structure having a low friction coefficient and high wear resistance. The composite sliding structure (1) has segment structure hard films (2) placed, with hard films separated from each other, on the surface of a base substance (4), a segment groove (5) formed between the individual segment structure hard films (2, 2), and solid lubrication layers (3) placed in a covering manner in the segment grooves (5) or fluid-like lubrication layers (3’) placed in an impregnated manner in the segment groves (5). Further, a method of producing the composite sliding structure (1) is performed by forming, in a covering manner, the segment structure hard films (2) on the surface of the base substance (4) by using a physical vapor-phase growth method or a chemical vapor-phase growth method, and covering the segment grooves (5), provided between the segment structure hard films (2, 2) with intervals in between, with the solid lubrication layers (3) or impregnating the fluid-like lubrication layers (3’) in the segment grooves (5).
Inventors:
Ohtake, Naoto c/o Tokyo Institute of Technology (2-12-1 Ookayama, Meguro-k, Tokyo 50, 15285, JP)
Matsuo, Makoto c/o Matsuo industry corporation (4-18-13 Omori-nishi, Ota-k, Tokyo 15, 14300, JP)
Aoki, Yuichi c/o Tokyo Institute of Technology (2-12-1 Ookayama, Meguro-k, Tokyo 50, 15285, JP)
Matsuo, Makoto c/o Matsuo industry corporation (4-18-13 Omori-nishi, Ota-k, Tokyo 15, 14300, JP)
Aoki, Yuichi c/o Tokyo Institute of Technology (2-12-1 Ookayama, Meguro-k, Tokyo 50, 15285, JP)
Application Number:
PCT/JP2006/305065
Publication Date:
September 14, 2006
Filing Date:
March 08, 2006
Export Citation:
Assignee:
The Circle for the Promotion of Science and Engineering (2-12-1, Ookayama Meguro-k, Tokyo 50, 15285, JP)
Ohtake, Naoto c/o Tokyo Institute of Technology (2-12-1 Ookayama, Meguro-k, Tokyo 50, 15285, JP)
Matsuo, Makoto c/o Matsuo industry corporation (4-18-13 Omori-nishi, Ota-k, Tokyo 15, 14300, JP)
Aoki, Yuichi c/o Tokyo Institute of Technology (2-12-1 Ookayama, Meguro-k, Tokyo 50, 15285, JP)
Ohtake, Naoto c/o Tokyo Institute of Technology (2-12-1 Ookayama, Meguro-k, Tokyo 50, 15285, JP)
Matsuo, Makoto c/o Matsuo industry corporation (4-18-13 Omori-nishi, Ota-k, Tokyo 15, 14300, JP)
Aoki, Yuichi c/o Tokyo Institute of Technology (2-12-1 Ookayama, Meguro-k, Tokyo 50, 15285, JP)
International Classes:
C10M171/00; B32B9/00; C10M101/00; C10M103/00; C10M107/38; C10M107/50; C10M109/00; C10M125/00; C10M177/00; C23C26/00; F16C33/24; C10N20/00; C10N30/06; C10N40/02; C10N50/08; C10N50/10; C10N70/00
Attorney, Agent or Firm:
Aoki, Atsushi (SEIWA PATENT & LAW, Toranomon 37 Mori Bldg. 5-1, Toranomon 3-chom, Minato-ku Tokyo 23, 10584, JP)
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