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Title:
COMPOSITION FOR ACOUSTIC WAVE PROBE, SILICONE RESIN FOR ACOUSTIC WAVE PROBE USING SAME, ACOUSTIC WAVE PROBE, AND ULTRASONIC PROBE, AND ACOUSTIC WAVE MEASUREMENT DEVICE, ULTRASONIC DIAGNOSTIC DEVICE, PHOTOACOUSTIC WAVE MEASUREMENT DEVICE, AND ULTRASONIC ENDOSCOPE
Document Type and Number:
WIPO Patent Application WO/2017/130890
Kind Code:
A1
Abstract:
The present invention is: a composition for an acoustic wave probe containing a polysiloxane mixture including a polysiloxane having a vinyl group, a polysiloxane having two or more Si-H groups in the molecular chain thereof, and silica particles which are surface treated and have an average primary particle diameter of more than 16 nm and less than 100 nm; a silicone resin for an acoustic wave probe; an acoustic wave probe; an acoustic wave measurement device; an ultrasonic diagnostic device; an ultrasonic probe; a photoacoustic wave measurement device; and an ultrasonic endoscope.

Inventors:
NAKAI, Yoshihiro (577 Ushijima, Kaisei-machi, Ashigarakami-gu, Kanagawa 77, 〒2588577, JP)
OSAWA, Atsushi (577 Ushijima, Kaisei-machi, Ashigarakami-gu, Kanagawa 77, 〒2588577, JP)
Application Number:
JP2017/002078
Publication Date:
August 03, 2017
Filing Date:
January 23, 2017
Export Citation:
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Assignee:
FUJIFILM CORPORATION (26-30, Nishiazabu 2-chome Minato-k, Tokyo 20, 〒1068620, JP)
International Classes:
A61B8/00; A61B8/12; A61B8/13; C08K3/36; C08K9/06; C08K13/06; C08L83/05; C08L83/07; H04R17/00
Domestic Patent References:
WO2015146308A12015-10-01
Foreign References:
JP2009240782A2009-10-22
JP2015189818A2015-11-02
JP2002095081A2002-03-29
JP2007099582A2007-04-19
JP2014114175A2014-06-26
JP2005253751A2005-09-22
JP2003169802A2003-06-17
JP2013202050A2013-10-07
JP2013188465A2013-09-26
JP2013180330A2013-09-12
JP2013158435A2013-08-19
JP2013154139A2013-08-15
JP2011071842A2011-04-07
JP2006157320A2006-06-15
JP2008311700A2008-12-25
JP2016014141A2016-01-28
Other References:
See also references of EP 3409209A4
"Chemical Engineering Handbook", MARUZEN INC.
Attorney, Agent or Firm:
IIDA, Toshizo et al. (ISHII Bldg. 3F, 1-10 Shimbashi 3-chome, Minato-k, Tokyo 04, 〒1050004, JP)
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