COMPOSITION FOR ANTIREFLECTION OR LIGHT ABSORPTION FILM AND COMPOUNDS FOR USE IN THE SAME

Title:

COMPOSITION FOR ANTIREFLECTION OR LIGHT ABSORPTION FILM AND COMPOUNDS FOR USE IN THE SAME

Document Type and Number:

WIPO Patent Application WO/1998/054619

Kind Code:

A1

Abstract:

A composition capable of forming an antireflection or light absorption film which satisfactorily absorbs radiations having wavelengths of 100 to 450 nm, is free from the diffusion of a photo-generated acid into the film or the intermixing of a resist with the film, and is excellent in storage stability and step coverage properties; and novel compounds and novel polymers useful for the composition. The composition contains a compound which is a (meth)acrylic monomer or polymer having at least one isocyanate or thioisocyanate group bonded to a side chain thereof through an alkylene group, etc., or contains the compound or polymer which has an aminated or hydroxylated organic chromophore which absorbs light in the wavelength region of 100 to 450 nm and is bonded to the isocyanate or thioisocyanate group. The composition is applied to a substrate and baked to form a film serving as, e.g., an antireflection film. A chemical-amplification-type resist is applied to this film, and the resist film is exposed to light and then developed to form a resist image with high resolution. Due to the presence of the isocyanate or thioisocyanate group in the compound, the film serving as, e.g., an antireflection film is cured through cross-linking during baking. Due to the presence of the organic chromophore, the film absorbs exposure light in the wavelength region of 100 to 450 nm.

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Inventors:

PADMANABAN MUNIRATHNA (US)
KANG WEN-BING (JP)
TANAKA HATSUYUKI (JP)
KIMURA KEN (JP)
PAWLOWSKI GEORG (JP)

Application Number:

PCT/JP1998/002234

Publication Date:

December 03, 1998

Filing Date:

May 21, 1998

Export Citation:

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Assignee:

CLARIANT INT LTD (CH)
PADMANABAN MUNIRATHNA (US)
KANG WEN BING (JP)
TANAKA HATSUYUKI (JP)
KIMURA KEN (JP)
PAWLOWSKI GEORG (JP)

International Classes:

G03F7/11; C08F220/34; C08G18/28; C08G18/72; C08G18/81; C09D4/00; C09D5/32; G03F7/09; G03F7/004; (IPC1-7): G03F7/11; C08F20/10; C08F20/34; C08F20/38; C08F22/04; C08F22/40; H01L21/027

Foreign References:

JPH0675378A	1994-03-18
JPH06118631A	1994-04-28
JPS59166513A	1984-09-19
JPH0688064A	1994-03-29
JPH0688066A	1994-03-29
JPH06321888A	1994-11-22
JPH02150410A	1990-06-08
JPH01165612A	1989-06-29
JPH02238010A	1990-09-20
JPH04239509A	1992-08-27
JPH06118656A	1994-04-28
JPH08224295A	1996-09-03

Other References: