Title:
COMPOSITION FOR CLEANING BLADES FOR ELECTROPHOTOGRAPHIC APPARATUSES AND CLEANING BLADE FOR ELECTROPHOTOGRAPHIC APPARATUSES
Document Type and Number:
WIPO Patent Application WO/2017/017997
Kind Code:
A1
Abstract:
To provide: a composition for cleaning blades for electrophotographic apparatuses, which is not susceptible to wear, chipping, curling or contamination; and a cleaning blade for electrophotographic apparatuses. A urethane composition which contains (a) a polyester polyol, (b) a polyisocyanate and (c) a modified silicone oil, and wherein: the modified silicone oil (c) contains a polysiloxane block and an alkylene oxide block; and the hydroxyl group of the alkylene oxide block is protected by a protecting group and thus a hydroxyl group is not contained in the modified silicone oil. A cleaning blade is formed of a molded body of this urethane composition, and contains a polyurethane elastomer and (c) a modified silicone oil.
Inventors:
MIYAGAWA SHIMPEI (JP)
ARATA TOSHIHIKO (JP)
ISHIDA MASANORI (JP)
TAKEYAMA KADAI (JP)
ARATA TOSHIHIKO (JP)
ISHIDA MASANORI (JP)
TAKEYAMA KADAI (JP)
Application Number:
PCT/JP2016/059308
Publication Date:
February 02, 2017
Filing Date:
March 24, 2016
Export Citation:
Assignee:
SUMITOMO RIKO CO LTD (JP)
International Classes:
G03G21/00; C08G18/42; C08G18/65; C08L75/06; C08L83/12
Foreign References:
| JPS57201277A | 1982-12-09 | |||
| JPH09218624A | 1997-08-19 | |||
| JP2001075451A | 2001-03-23 | |||
| JP2003140519A | 2003-05-16 |
Attorney, Agent or Firm:
WENO & PARTNERS (JP)
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