Title:
COMPOSITION FOR COATING FILM FORMATION PURPOSES
Document Type and Number:
WIPO Patent Application WO/2012/137974
Kind Code:
A1
Abstract:
The surface of a base is treated with a composition for coating film formation purposes, wherein the composition comprises (A) a silicone resin containing an alkenyl group, (B) a silicon-atom-bound and hydrogen-atom-containing organopolysiloxane containing 10-160 siloxane units on average, and (C) a condensation reaction catalyst. The composition enables the formation of a water-repellent coating film that exhibits high hydrophobicity after being washed with a solvent and has sufficient water-skiing performance, and also enables the provision of a base, e.g., a heat-releasing plate, having high hydrophobicity.
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Inventors:
OKAWA TADASHI (JP)
NISHIJIMA KAZUHIRO (JP)
KITAURA EIJI (JP)
NISHIJIMA KAZUHIRO (JP)
KITAURA EIJI (JP)
Application Number:
PCT/JP2012/059831
Publication Date:
October 11, 2012
Filing Date:
April 04, 2012
Export Citation:
Assignee:
DOW CORNING TORAY CO LTD (JP)
OKAWA TADASHI (JP)
NISHIJIMA KAZUHIRO (JP)
KITAURA EIJI (JP)
OKAWA TADASHI (JP)
NISHIJIMA KAZUHIRO (JP)
KITAURA EIJI (JP)
International Classes:
C09D183/06; B32B27/00; C09D7/12; C09D183/05; F28F13/18
Foreign References:
| JPH06329914A | 1994-11-29 | |||
| JP2001295078A | 2001-10-26 | |||
| JPH1143777A | 1999-02-16 | |||
| JP2010060162A | 2010-03-18 |
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Claims:
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