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Title:
COMPOSITION FOR COATING SUBSTRATE WITH HEIGHT DIFFERENCE, WHICH CONTAINS POLYETHER RESIN HAVING PHOTOCROSSLINKABLE GROUP
Document Type and Number:
WIPO Patent Application WO/2018/186310
Kind Code:
A1
Abstract:
[Problem] To provide a composition for coating a substrate with height difference, which has high fillability into patterns and forms a film having planarization properties, said film being formed into a coating film by means of photocuring, and which forms a coating film on a substrate, said coating film exhibiting high heat resistance after irradiation of light. [Solution] A photocurable composition for coating a substrate with height difference, which contains a polymer containing a unit structure of formula (1). [In formula (1), each of A1, A2 and A3 independently represents an aromatic ring with 6 to 100 carbon atoms, which optionally contains a heteroatom, or a hydrocarbon group containing an aromatic ring with 6 to 100 carbon atoms, which optionally contains a heteroatom; and each of B1, B2 and B3 independently represents a group of formula (2). (In formula (2), R1 represents an alkylene group with 1 to 10 carbon atoms, an alkenylene group with 1 to 10 carbon atoms, an alkynylene group with 1 to 10 carbon atoms, an arylene group with 6 to 40 carbon atoms, an oxygen atom, a carbonyl group, a sulfur atom, -C(O)-O-, -C(O)-NRa-, -NRb-, or a group obtained by combining these groups; and R2 represents a hydrogen atom or an alkyl group with 1 to 10 carbon atoms.)]

Inventors:
TOKUNAGA HIKARU (JP)
ENDO TAKAFUMI (JP)
HASHIMOTO KEISUKE (JP)
SAKAMOTO RIKIMARU (JP)
Application Number:
PCT/JP2018/013894
Publication Date:
October 11, 2018
Filing Date:
March 30, 2018
Export Citation:
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Assignee:
NISSAN CHEMICAL CORP (JP)
International Classes:
G03F7/11; C08F290/14; G03F7/20; G03F7/26; H01L21/027
Domestic Patent References:
WO2012050064A12012-04-19
WO2016159358A12016-10-06
WO2014109186A12014-07-17
WO2016208518A12016-12-29
WO2013080929A12013-06-06
Attorney, Agent or Firm:
HANABUSA PATENT & TRADEMARK OFFICE (JP)
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