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Title:
COMPOSITION, COMPOUND AND MEMBRANE FORMATION METHOD
Document Type and Number:
WIPO Patent Application WO/2010/150816
Kind Code:
A1
Abstract:
Disclosed is a composition including at least one compound represented by formula (Z): A-L-{D1-(E)q-D2-(B)m-Z1-R}p (Z), where A is a linear or cyclic residue having a valence of p; L is a single bond or a divalent linking group; p is an integer not less than 2; D1 is a carbonyl group (-C(=O)-) or a sulfonyl group (-S(=O)2-); D2 is a carbonyl group (-C(=O)-), a sulfonyl group (-S(=O)2-), a carboxyl group (-C(=O)O-), a sulfoxyl group (-S(=O)2O-), a carbamoyl group (-C(=O)N(Alk)-) or a sulfamoyl group (-S(=O)2N(Alk)-); E is a divalent group; R is a hydrogen atom or a substituted or unsubstituted alkyl group having not more than 7 carbon atoms; B is an oxyethylene group or the like; and Z1 is a single bond or a divalent group.

Inventors:
KAWATA KEN (JP)
WATANABE SAISUKE (JP)
KAWAMOTO HIROSHI (JP)
Application Number:
PCT/JP2010/060639
Publication Date:
December 29, 2010
Filing Date:
June 23, 2010
Export Citation:
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Assignee:
FUJIFILM CORP (JP)
KAWATA KEN (JP)
WATANABE SAISUKE (JP)
KAWAMOTO HIROSHI (JP)
International Classes:
C10M105/38; C07C69/36; C07C69/40; C07C69/60; C07C219/06; C07C233/18; C10M105/36; C10M105/58; C10M105/68; C10M105/76; C10M107/24; C10M107/28; C10M107/32; C10M107/50; C10M129/72; C10M129/74; C10M133/06; C10M133/16; C10M135/18; C10M137/10; C10M139/00; C10M145/04; C10M145/12; C10M145/24; C10M155/02; C10N10/04; C10N10/12; C10N20/02; C10N30/06; C10N30/08; C10N30/10; C10N40/02; C10N40/22; C10N40/25; C10N40/36; C10N50/10
Domestic Patent References:
WO2004024237A22004-03-25
WO2009119831A12009-10-01
Foreign References:
US20070276121A12007-11-29
JPH11158482A1999-06-15
JP2002507657A2002-03-12
JP2005036223A2005-02-10
JP2002530476A2002-09-17
JPH03169685A1991-07-23
JP2004244593A2004-09-02
GB808265A1959-01-28
JPH10289436A1998-10-27
Other References:
BRENT VERNON ET AL., JOURNAL OF BIOMEDICAL MATERIALS RESEARCH PART A, vol. 64(A), no. 3, 2003, pages 447 - 456
Attorney, Agent or Firm:
SIKs & Co. (JP)
Patent business corporation patent firm Sykes (JP)
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