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Patent Searching and Data


Title:
COMPOSITION COMPRISING AN OXIDIZING AND COMPLEXING COMPOUND
Document Type and Number:
WIPO Patent Application WO2002051961
Kind Code:
A3
Abstract:
The present invention is related to a composition comprising an oxidizing compound and a complexing compound with the chemical formula wherein R1, R2, R3 and R4 are selected from the group consisting of H and any organic side chain. The oxidizing compound can be in the form of an aqueous solution. The complexing compound is for complexing metal ions. Metal ions can be present in the solution or in an external medium being contacted with the solution. The present invention can be used for cleaning a semiconductor substrate.

Inventors:
VOS RITA (BE)
MERTENS PAUL (BE)
FESTER ALBRECHT (DE)
DOLL OLIVER (DE)
KOLBESEN BERND (DE)
Application Number:
PCT/BE2001/000219
Publication Date:
October 17, 2002
Filing Date:
December 21, 2001
Export Citation:
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Assignee:
IMEC INTER UNI MICRO ELECTR (BE)
ASHLAND INC (US)
VOS RITA (BE)
MERTENS PAUL (BE)
FESTER ALBRECHT (DE)
DOLL OLIVER (DE)
KOLBESEN BERND (DE)
International Classes:
B08B3/08; A61K6/00; C01B15/037; C09K3/00; C09K15/30; C11D3/28; C11D3/39; C11D3/395; C11D11/00; D06L3/02; H01L21/304; (IPC1-7): C01B15/037; H01L21/306; A61K6/00; D21C9/08; C09K15/30
Foreign References:
EP1006112A12000-06-07
US5480894A1996-01-02
EP1091395A12001-04-11
EP0624640A21994-11-17
US2624655A1953-01-06
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