Title:
COMPOSITION CONTAINING POLYSILSESQUIOXANE-BASED COMPOUND, METHOD FOR PRODUCING SAME, AND SEALING MATERIAL AND FILM COMPRISING SAID COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2019/017332
Kind Code:
A1
Abstract:
Provided is a resin composition which exhibits excellent light transmissivity in the ultraviolet to visible region and excellent moldability, and has a low coefficient of linear expansion following molding. A cage type silsesquioxane having two or more SiH groups in the molecule and a monomer having two or more hydroxyl groups in the molecule are copolymerized in the presence of a dehydrogenation catalyst. The molecular length of the monomer is preferably similar to that of the cage type silsesquioxane, and the monomer is used at a quantity of 0.5 equivalents or more relative to the cage type silsesquioxane. By adjusting the quantity of the monomer, it is possible to adjust the density and brittleness when the composition is formed into a molded article.
Inventors:
ITO KOSABURO (JP)
TADA REIKI (JP)
GUNJI TAKAHIRO (JP)
TADA REIKI (JP)
GUNJI TAKAHIRO (JP)
Application Number:
PCT/JP2018/026717
Publication Date:
January 24, 2019
Filing Date:
July 17, 2018
Export Citation:
Assignee:
STANLEY ELECTRIC CO LTD (JP)
UNIV TOKYO SCIENCE FOUND (JP)
UNIV TOKYO SCIENCE FOUND (JP)
International Classes:
C08G77/50; C08L83/14; H01L33/56
Foreign References:
| JP2002069191A | 2002-03-08 | |||
| JP2007291273A | 2007-11-08 |
Other References:
GUNJI TAKAHIRO: "Synthesis of Element-block Polymers from POSS Based on the Solgel Method", CERAMICS JAPAN, vol. 51, no. 11, 1 November 2016 (2016-11-01), pages 765 - 769
Attorney, Agent or Firm:
SANNOZAKA PATENT LAW FIRM (JP)
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