Title:
COMPOSITION CURABLE WITH ACTINIC ENERGY RAY
Document Type and Number:
WIPO Patent Application WO/2007/043430
Kind Code:
A1
Abstract:
An actinic-energy-ray-curable composition which, when used as an actinic-energy-ray-curable composition for pattern formation, has high sensitivity to exposure light and satisfactory developability and can form a fine and accurate pattern. After cure, the pattern is excellent in various properties including coating film strength, heat resistance, and chemical resistance. Also provided is a method of forming a pattern. The composition comprises as essential ingredients (a) a compound which is an adduct of a hydroxylated compound having three or more (meth)acryloyl groups with an acid anhydride and (b) an acid anhydride or/and a hydrolyzate of an acid anhydride, wherein the ingredient (b) is contained in an amount of 0.1-20 parts by mass per 100 parts by mass of the ingredient (a). The method comprises applying the composition to a substrate to form a coating film, subsequently irradiating the film with actinic energy rays through a mask having a specific pattern and placed over the film to thereby cure it, and removing uncured parts with a developing liquid.
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Inventors:
HASEGAWA MITSUTAKA (JP)
YACHI KENTARO (JP)
YACHI KENTARO (JP)
Application Number:
PCT/JP2006/319941
Publication Date:
April 19, 2007
Filing Date:
October 05, 2006
Export Citation:
Assignee:
TOAGOSEI CO LTD (JP)
HASEGAWA MITSUTAKA (JP)
YACHI KENTARO (JP)
HASEGAWA MITSUTAKA (JP)
YACHI KENTARO (JP)
International Classes:
C08F20/26; C08F290/06; G03F7/004; G03F7/027
Foreign References:
| JP2001064324A | 2001-03-13 | |||
| JPH08292316A | 1996-11-05 | |||
| JP2003021899A | 2003-01-24 | |||
| JPH07316230A | 1995-12-05 | |||
| JPS5931947A | 1984-02-21 | |||
| JPS61194438A | 1986-08-28 |
Attorney, Agent or Firm:
IDE, Masatake et al. (9F Gobancho Grand Bldg., 3-1, Gobanch, Chiyoda-ku Tokyo 76, JP)
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