Title:
COMPOSITION FOR DEPOSITING SILICON-CONTAINING THIN FILM CONTAINING BIS(AMINOSILYL)ALKYLAMINE COMPOUND AND METHOD FOR MANUFACTURING SILICON-CONTAINING THIN FILM USING THE SAME
Document Type and Number:
WIPO Patent Application WO/2018/182309
Kind Code:
A1
Abstract:
Provided are a composition for depositing a silicon-containing thin film containing a bis(aminosilyl)alkylamine compound and a method for manufacturing a silicon-containing thin film using the same, and more particularly, a composition for depositing a silicon-containing thin film, containing the bis(aminosilyl)alkylamine compound capable of being usefully used as a precursor of the silicon-containing thin film, and a method for manufacturing a silicon-containing thin film using the same.
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Inventors:
KIM SUNG GI (KR)
PARK JEONG JOO (KR)
PARK JOONG JIN (KR)
JANG SE JIN (KR)
YANG BYEONG-IL (KR)
LEE SANG-DO (KR)
LEE SAM DONG (KR)
LEE SANG ICK (KR)
KIM MYONG WOON (KR)
PARK JEONG JOO (KR)
PARK JOONG JIN (KR)
JANG SE JIN (KR)
YANG BYEONG-IL (KR)
LEE SANG-DO (KR)
LEE SAM DONG (KR)
LEE SANG ICK (KR)
KIM MYONG WOON (KR)
Application Number:
PCT/KR2018/003655
Publication Date:
October 04, 2018
Filing Date:
March 28, 2018
Export Citation:
Assignee:
DNF CO LTD (KR)
International Classes:
C09D183/16; C09D4/00; C23C16/24; C23C16/30; C23C16/34; C23C16/36; C23C16/40; C23C16/50; H01L21/02
Domestic Patent References:
| WO2016049154A1 | 2016-03-31 | |||
| WO2014196827A2 | 2014-12-11 |
Foreign References:
| US20160280724A1 | 2016-09-29 | |||
| KR20140143682A | 2014-12-17 | |||
| CN103401019A | 2013-11-20 |
Other References:
FREZA, S. ET AL.: "Influence of substituents in vinyl groups on reactivity of parylene during polymerization process", CHEMICAL PHYSICS, vol. 368, no. 3, March 2010 (2010-03-01), pages 126 - 132, XP026938070
Attorney, Agent or Firm:
PLUS INTERNATIONAL IP LAW FIRM (KR)
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