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Title:
COMPOSITION FOR FORMING CURED FILM, ORIENTATION MATERIAL, AND PHASE DIFFERENCE MATERIAL
Document Type and Number:
WIPO Patent Application WO/2014/104320
Kind Code:
A1
Abstract:
[Problem] To provide a composition for forming a cured film with which a cured film having excellent photoreactive efficiency and solvent resistance is formed, and to provide an orientation material for photo-orientation and a phase difference material formed using the orientation material. [Solution] This composition for forming a cured film comprises (A) a compound comprising groups capable of photo-orientation and at least one type of substitution group selected from among hydroxyl, carboxyl, amino, and alkoxysilyl groups, and (B) a self-crosslinkable compound having substitution groups capable of thermal reaction with component (A). A cured film is formed using the composition for forming a cured film, and an orientation material is formed by means of photo-orientation technology. A polymerizable liquid crystal is applied over the orientation material and cured to obtain a phase difference material.

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Inventors:
YUKAWA SHOJIRO (JP)
ISHIDA TOMOHISA (JP)
HATANAKA TADASHI (JP)
Application Number:
PCT/JP2013/085165
Publication Date:
July 03, 2014
Filing Date:
December 27, 2013
Export Citation:
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Assignee:
NISSAN CHEMICAL IND LTD (JP)
International Classes:
C08L101/02; C08K5/04; C08K5/23; C08L33/00; G02B5/30; G02F1/13363; G02F1/1337
Domestic Patent References:
WO2011126021A12011-10-13
WO2011126019A12011-10-13
WO2012018121A12012-02-09
WO2011126022A12011-10-13
WO2011010635A12011-01-27
WO2013054784A12013-04-18
WO2013146469A12013-10-03
WO2014010688A12014-01-16
Foreign References:
JP2007121721A2007-05-17
JP2007256744A2007-10-04
JP2014012823A2014-01-23
JP2009258650A2009-11-05
JP2002121407A2002-04-23
JP2009282341A2009-12-03
JP2003222868A2003-08-08
Attorney, Agent or Firm:
HANABUSA, Tsuneo et al. (JP)
Sepal Tsuneo (JP)
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