Title:
COMPOSITION FOR FORMING EASY-TO-DETACH THIN RESIN FILM, AND EASY-TO-DETACH THIN RESIN FILM
Document Type and Number:
WIPO Patent Application WO/2016/121815
Kind Code:
A1
Abstract:
A composition for forming easy-to-detach thin resin films, characterized by comprising a urethane (meth)acrylate compound and either a first polymerizable composition comprising a free-radical polymerization initiator and an ethylenic monomer containing a tertiary butoxy group or a polymer of a second polymerizable composition comprising the ethylenic monomer containing a tertiary butoxy group, the amount of the ethylenic monomer containing a tertiary butoxy group being 5 mass% or larger but less than 95 mass% relative to the sum of the mass of the total amount of the monomer(s) contained in the first polymerizable composition or in the second polymerizable composition and the mass of the urethane (meth)acrylate compound.
Inventors:
SATO TETSUO (JP)
Application Number:
PCT/JP2016/052328
Publication Date:
August 04, 2016
Filing Date:
January 27, 2016
Export Citation:
Assignee:
NISSAN CHEMICAL IND LTD (JP)
International Classes:
C08F220/16; C08F220/34; C09J4/02; C09J4/06; C09J5/00; C09J7/10; C09J133/06; C09J157/00
Foreign References:
| JPH11119169A | 1999-04-30 | |||
| JPH11119168A | 1999-04-30 | |||
| JPH115809A | 1999-01-12 | |||
| JP2010024317A | 2010-02-04 |
Other References:
See also references of EP 3252087A4
Attorney, Agent or Firm:
KURIHARA, Hiroyuki et al. (JP)
Hiroyuki Kurihara (JP)
Hiroyuki Kurihara (JP)
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