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Title:
COMPOSITION FOR FORMING FILM, FILM, METHOD FOR FORMING RESIST UNDERLAYER FILM, METHOD FOR MANUFACTURING PATTERNED SUBSTRATE, AND COMPOUND
Document Type and Number:
WIPO Patent Application WO/2017/208796
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide: a composition for forming a film, the composition being capable of forming a film which has excellent flatness as well as excellent solvent resistance, etching resistance, and heat resistance; a film; a method for forming a resist underlayer film; a method for manufacturing a patterned substrate; and a compound. The present invention pertains to a composition which is for forming a film and contains a solvent and a compound having a group represented by formula (1) below. In formula (1), R1-R4 are each independently a hydrogen atom or a monovalent organic group having 1-20 carbon atoms, or exhibit a ring structure having 3-20 ring members, the ring structure being formed along with carbon atoms or carbon chains that are bonded by these groups. Ar1 is a group obtained by removing from an arene, having 6-20 carbon atoms, the hydrogen atoms on (n+3) aromatic rings. R5 is a hydroxy group, a halogen atom, a nitro group, or a monovalent organic group having 1-20 carbon atoms. n is an integer from 0 to 9.

Inventors:
NOSAKA NAOYA (JP)
WAKAMATSU GOUJI (JP)
ABE TSUBASA (JP)
MATSUMURA YUUSHI (JP)
MIYAKE MASAYUKI (JP)
TAKIMOTO YOSHIO (JP)
Application Number:
PCT/JP2017/018222
Publication Date:
December 07, 2017
Filing Date:
May 15, 2017
Export Citation:
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Assignee:
JSR CORP (JP)
International Classes:
C08F34/02; G03F7/11; G03F7/26; H01L21/027
Domestic Patent References:
WO2016013598A12016-01-28
Foreign References:
CN103265706A2013-08-28
JPH08295690A1996-11-12
Other References:
Y.MOREL ET AL.: "Nonlinear absorption spectra of transparent organic crystals for optical limiting applications at visible wavelengths", SYNTHETIC METALS, vol. 115, 2000, pages 265 - 268, XP055600391
Attorney, Agent or Firm:
AMANO Kazunori (JP)
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