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Title:
COMPOSITION FOR FORMING IMPURITY DIFFUSION LAYER, PROCESS FOR PRODUCING IMPURITY DIFFUSION LAYER, AND PROCESS FOR PRODUCING SOLAR CELL ELEMENT
Document Type and Number:
WIPO Patent Application WO/2012/005253
Kind Code:
A1
Abstract:
Disclosed is a composition for forming an impurity diffusion layer, the composition comprising a glass powder containing a donor element or acceptor element, a binder having a weight-average molecular weight of 5,000-500,000, and a solvent. When the composition is for forming an n-type diffusion layer, the glass powder contains a donor element. When the composition is for forming a p-type diffusion layer, the glass powder contains an acceptor element. By applying the composition for impurity diffusion layer formation and subjecting the applied composition to a thermal diffusion treatment, an n-type diffusion layer or a p-type diffusion layer is produced. A solar cell element having the n-type diffusion layer or p-type diffusion layer is produced.

Inventors:
ADACHI SHUUICHIROU (JP)
YOSHIDA MASATO (JP)
NOJIRI TAKESHI (JP)
OKANIWA KAORU (JP)
MACHII YOUICHI (JP)
IWAMURO MITSUNORI (JP)
SATOU TETSUYA (JP)
KIZAWA KEIKO (JP)
Application Number:
PCT/JP2011/065386
Publication Date:
January 12, 2012
Filing Date:
July 05, 2011
Export Citation:
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Assignee:
HITACHI CHEMICAL CO LTD (JP)
ADACHI SHUUICHIROU (JP)
YOSHIDA MASATO (JP)
NOJIRI TAKESHI (JP)
OKANIWA KAORU (JP)
MACHII YOUICHI (JP)
IWAMURO MITSUNORI (JP)
SATOU TETSUYA (JP)
KIZAWA KEIKO (JP)
International Classes:
H01L21/225; C03C8/18; H01L31/04
Foreign References:
JPH02162720A1990-06-22
JPH04174517A1992-06-22
JPH04158514A1992-06-01
Attorney, Agent or Firm:
HIZATATE, Shoji et al. (JP)
膝舘 Yoshiharu (JP)
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Claims: