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Title:
COMPOSITION FOR FORMING PATTERN, AND PATTERN FORMING METHOD
Document Type and Number:
WIPO Patent Application WO/2018/008481
Kind Code:
A1
Abstract:
The composition for forming a pattern according to the present invention contains: a first polymer having a first block containing a first structural unit derived from a substituted or unsubstituted styrene, and a second block containing a second structural unit other than the first structural unit; a second polymer having the first structural unit, and a group which is linked to at least one end of a main chain and includes a polar group; and a solvent. The polar group is preferably a hydroxy group or a carboxyl group. The number average molecular weight of the second polymer is preferably 6,000 or less. The mass ratio of the second polymer to the first polymer is preferably 0.15-0.4. The solvent preferably contains a first compound having a hydroxy group and an alkylester group.

Inventors:
HORI Masafumi (9-2 Higashi-Shinbashi 1-chome, Minato-k, Tokyo 40, 〒1058640, JP)
KOMATSU Hiroyuki (9-2 Higashi-Shinbashi 1-chome, Minato-k, Tokyo 40, 〒1058640, JP)
ODA Tomohiro (9-2 Higashi-Shinbashi 1-chome, Minato-k, Tokyo 40, 〒1058640, JP)
OSAKI Hitoshi (9-2 Higashi-Shinbashi 1-chome, Minato-k, Tokyo 40, 〒1058640, JP)
NARUOKA Takehiko (9-2 Higashi-Shinbashi 1-chome, Minato-k, Tokyo 40, 〒1058640, JP)
Application Number:
JP2017/023649
Publication Date:
January 11, 2018
Filing Date:
June 27, 2017
Export Citation:
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Assignee:
JSR CORPORATION (9-2 Higashi-Shinbashi 1-chome, Minato-ku Tokyo, 40, 〒1058640, JP)
International Classes:
C08L53/00; B82Y30/00; B82Y40/00; C08F297/02; C08K5/10; C08L25/04; H01L21/027
Domestic Patent References:
WO2013069544A12013-05-16
Foreign References:
US20160186002A12016-06-30
US20160186003A12016-06-30
JP2015170723A2015-09-28
JP2014005325A2014-01-16
JP2013235187A2013-11-21
Attorney, Agent or Firm:
AMANO Kazunori (6th Floor Fujikogyo-Nishimotomachi Building, 1-18, Aioi-cho 1-chome, Chuo-ku, Kobe-sh, Hyogo 25, 〒6500025, JP)
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