Title:
COMPOSITION FOR FORMING RELEASE LAYER, AND RELEASE LAYER
Document Type and Number:
WIPO Patent Application WO/2018/025953
Kind Code:
A1
Abstract:
Provided is a composition for forming a release layer, the composition including polyamic acid represented by formula (1) and an organic solvent. (In the formula, X represents an aromatic group represented by formula (2a) or (2b), Y represents a divalent aromatic group having a fluorine atom, Z each independently represent an aromatic group represented by formula (3a) or (4a) when X is represented by formula (2a) or each independently represent an aromatic group represented by formula (3b) or (4b) when X is represented by formula (2b), and m represents a natural number.)
Inventors:
EBARA KAZUYA (JP)
SHINDO KAZUYA (JP)
SHINDO KAZUYA (JP)
Application Number:
PCT/JP2017/028204
Publication Date:
February 08, 2018
Filing Date:
August 03, 2017
Export Citation:
Assignee:
NISSAN CHEMICAL IND LTD (JP)
International Classes:
C09D179/08; B32B27/00; B32B27/34; C08G73/10; C08L79/08
Domestic Patent References:
| WO2016010003A1 | 2016-01-21 | |||
| WO2016129546A1 | 2016-08-18 | |||
| WO2016158990A1 | 2016-10-06 |
Foreign References:
| JP2016120630A | 2016-07-07 | |||
| JP2012040836A | 2012-03-01 | |||
| JP2015078254A | 2015-04-23 |
Attorney, Agent or Firm:
PATENT PROFESSIONAL CORPORATION EI-MEI PATENT OFFICE (JP)
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