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Title:
COMPOSITION FOR FORMING RELEASE LAYER, AND RELEASE LAYER
Document Type and Number:
WIPO Patent Application WO/2018/025953
Kind Code:
A1
Abstract:
Provided is a composition for forming a release layer, the composition including polyamic acid represented by formula (1) and an organic solvent. (In the formula, X represents an aromatic group represented by formula (2a) or (2b), Y represents a divalent aromatic group having a fluorine atom, Z each independently represent an aromatic group represented by formula (3a) or (4a) when X is represented by formula (2a) or each independently represent an aromatic group represented by formula (3b) or (4b) when X is represented by formula (2b), and m represents a natural number.)

Inventors:
EBARA Kazuya (NISSAN CHEMICAL INDUSTRIES LTD., 488-6, Suzumi-cho, Funabashi-sh, Chiba 52, 〒2740052, JP)
SHINDO Kazuya (NISSAN CHEMICAL INDUSTRIES LTD., 488-6, Suzumi-cho, Funabashi-sh, Chiba 52, 〒2740052, JP)
Application Number:
JP2017/028204
Publication Date:
February 08, 2018
Filing Date:
August 03, 2017
Export Citation:
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Assignee:
NISSAN CHEMICAL INDUSTRIES, LTD. (7-1 Kanda Nishiki-cho 3-chome, Chiyoda-ku Tokyo, 54, 〒1010054, JP)
International Classes:
C09D179/08; B32B27/00; B32B27/34; C08G73/10; C08L79/08
Attorney, Agent or Firm:
PATENT PROFESSIONAL CORPORATION EI-MEI PATENT OFFICE (GINZA OHTSUKA Bldg. 2F, 16-12 Ginza 2-chome, Chuo-k, Tokyo 61, 〒1040061, JP)
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