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Patent Searching and Data


Title:
COMPOSITION FOR FORMING RELEASING LAYER FOR TRANSPARENT RESIN SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2018/025954
Kind Code:
A1
Abstract:
Provided is a composition for forming a releasing layer for a transparent resin substrate, said composition including a polyamic acid, which is a reactant between a diamine component and a tetracarboxylic dianhydride component, and an organic solvent, wherein: the diamine component includes at least one of an aromatic diamine comprising an ester bond and/or an ether bond and an aromatic diamine not comprising an ester bond or an ether bond; the tetracarboxylic dianhydride component includes at least one of an aromatic tetracarboxylic dianhydride comprising an ester bond and/or an ether bond and an aromatic tetracarboxylic dianhydride not comprising an ester bond or an ether bond; and at least one of the diamine component and the tetracarboxylic dianhydride component includes a component comprising an ester bond and/or an ether bond.

Inventors:
SHINDO Kazuya (NISSAN CHEMICAL INDUSTRIES LTD., 488-6, Suzumi-cho, Funabashi-sh, Chiba 52, 〒2740052, JP)
EBARA Kazuya (NISSAN CHEMICAL INDUSTRIES LTD., 488-6, Suzumi-cho, Funabashi-sh, Chiba 52, 〒2740052, JP)
YE ChenJia (5F., No.67, Luke 2nd Rd., Luzhu Dist, Kaohsiung Cit, ., 82151, TW)
Application Number:
JP2017/028210
Publication Date:
February 08, 2018
Filing Date:
August 03, 2017
Export Citation:
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Assignee:
NISSAN CHEMICAL INDUSTRIES, LTD. (7-1 Kanda Nishiki-cho 3-chome, Chiyoda-ku Tokyo, 54, 〒1010054, JP)
International Classes:
C08L79/08; B32B27/34; C08K5/20; C08K5/3415; C09D179/08; H05K3/00
Attorney, Agent or Firm:
PATENT PROFESSIONAL CORPORATION EI-MEI PATENT OFFICE (GINZA OHTSUKA Bldg. 2F, 16-12 Ginza 2-chome, Chuo-k, Tokyo 61, 〒1040061, JP)
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