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Title:
COMPOSITION FOR FORMING RELEASING LAYER
Document Type and Number:
WIPO Patent Application WO/2018/025957
Kind Code:
A1
Abstract:
Provided is a composition for forming a releasing layer, said composition including a polyamic acid, which is a reactant between a diamine component and a tetracarboxylic dianhydride component, and an organic solvent, wherein the diamine component includes 2,2'-bis(trifluoromethyl)-4,4'-diaminobiphenyl and the tetracarboxylic dianhydride component includes an aromatic tetracarboxylic dianhydride represented by formula (B1) or (B2).

Inventors:
SHINDO KAZUYA (JP)
EBARA KAZUYA (JP)
Application Number:
PCT/JP2017/028216
Publication Date:
February 08, 2018
Filing Date:
August 03, 2017
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Assignee:
NISSAN CHEMICAL IND LTD (JP)
International Classes:
C08L79/08; C08G73/10
Foreign References:
JP2015078254A2015-04-23
JP2015136868A2015-07-30
JP2015135464A2015-07-27
Attorney, Agent or Firm:
PATENT PROFESSIONAL CORPORATION EI-MEI PATENT OFFICE (JP)
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