Title:
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM WHICH COMPRISES POLYMER HAVING ACETAL STRUCTURE IN SIDE CHAIN THEREOF, AND METHOD FOR FORMING RESIST PATTERN
Document Type and Number:
WIPO Patent Application WO/2010/104074
Kind Code:
A1
Abstract:
Disclosed is a composition for forming a resist underlayer film, which contains a polymer having an acetal structure in a side chain thereof. Also disclosed is a method for forming a resist pattern.
Specifically disclosed is a composition for forming a resist underlayer film, which comprises a component (A), a component (B) and a solvent.
The component (A): a polymer having a constituent unit represented by formula (1) and having a weight average molecular weight of 1,000 to 200,000.
The component (B): a crosslinkable compound.
[In the formula, R1 represents a hydrogen atom or a methyl group; R2 represents a hydrogen atom or an alkyl group having 1 to 3 carbon atoms; R3 represents a hydrogen atom or a methyl group; P represents a bivalent organic group; and Q represents an unsubstituted naphthalene ring (a naphthyl group) or anthracene ring (an anthracenyl group), or a naphthalene ring (a naphthyl group) or anthracene ring (an anthracenyl group) having at least one substituent selected from a group consisting of a hydroxy group, a carboxyl group, a halogen atom, a sulfonyl group, an amino group, a cyano group, a nitro group, an alkyl group having 1 to 10 carbon atom and an aryl group.]
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Inventors:
KISHIOKA, Takahiro (Ltd. Electronic Materials Research Laboratories 635, Sasakura, Fuchu-machi, Toyama-sh, Toyama 53, 〒9392753, JP)
岸岡 高広 (〒53 富山県富山市婦中町笹倉６３５ 日産化学工業株式会社 電子材料研究所内 Toyama, 〒9392753, JP)
岸岡 高広 (〒53 富山県富山市婦中町笹倉６３５ 日産化学工業株式会社 電子材料研究所内 Toyama, 〒9392753, JP)
Application Number:
JP2010/053885
Publication Date:
September 16, 2010
Filing Date:
March 09, 2010
Export Citation:
Assignee:
NISSAN CHEMICAL INDUSTRIES, LTD. (7-1 Kanda-Nishiki-cho 3-chome, Chiyoda-ku Tokyo, 54, 〒1010054, JP)
日産化学工業株式会社 (〒54 東京都千代田区神田錦町３丁目７番地１ Tokyo, 〒1010054, JP)
KISHIOKA, Takahiro (Ltd. Electronic Materials Research Laboratories 635, Sasakura, Fuchu-machi, Toyama-sh, Toyama 53, 〒9392753, JP)
日産化学工業株式会社 (〒54 東京都千代田区神田錦町３丁目７番地１ Tokyo, 〒1010054, JP)
KISHIOKA, Takahiro (Ltd. Electronic Materials Research Laboratories 635, Sasakura, Fuchu-machi, Toyama-sh, Toyama 53, 〒9392753, JP)
International Classes:
G03F7/11
Attorney, Agent or Firm:
HANABUSA, Tsuneo et al. (Shin-Ochanomizu Urban Trinity 2, Kandasurugadai 3-chom, Chiyoda-ku Tokyo 62, 〒1010062, JP)
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