Title:
COMPOSITION FOR FORMING SIDE WALL
Document Type and Number:
WIPO Patent Application WO/2010/032796
Kind Code:
A1
Abstract:
A composition for forming a side wall, which is suitable for forming a side wall in contact with a photoresist pattern. Specifically disclosed is a composition for forming a side wall for lithography, which contains a silicon-containing polymer, which has a silanol group at an end while containing structural units represented by formula (1a) and formula (1b) (wherein R3 represents an organic group), and a solvent mainly composed of a specific organic solvent. Also specifically disclosed is a composition for forming a side wall for lithography, which contains a silicon-containing polymer, which has a silanol group or alternatively a silanol group and a hydrogen atom at an end while containing at least one structural unit represented by formula (2) and/or formula (3) (wherein R2 and R1 each represents an organic group), and a solvent mainly composed of a specific organic solvent.
Inventors:
MARUYAMA, Daisuke (Ltd. Electronic Materials Research Laboratories 635, Sasakura, Fuchu-machi, Toyama-sh, Toyama 53, 〒9392753, JP)
丸山 大輔 (〒53 富山県富山市婦中町笹倉６３５ 日産化学工業株式会社 電子材料研究所内 Toyama, 〒9392753, JP)
YAGUCHI, Hiroaki (Ltd. Electronic Materials Research Laboratories 635, Sasakura, Fuchu-machi, Toyama-sh, Toyama 53, 〒9392753, JP)
丸山 大輔 (〒53 富山県富山市婦中町笹倉６３５ 日産化学工業株式会社 電子材料研究所内 Toyama, 〒9392753, JP)
YAGUCHI, Hiroaki (Ltd. Electronic Materials Research Laboratories 635, Sasakura, Fuchu-machi, Toyama-sh, Toyama 53, 〒9392753, JP)
Application Number:
JP2009/066277
Publication Date:
March 25, 2010
Filing Date:
September 17, 2009
Export Citation:
Assignee:
NISSAN CHEMICAL INDUSTRIES, LTD. (7-1 Kanda-nishiki-cho 3-chome, Chiyoda-ku Tokyo, 54, 〒1010054, JP)
日産化学工業株式会社 (〒54 東京都千代田区神田錦町３丁目７番地１ Tokyo, 〒1010054, JP)
MARUYAMA, Daisuke (Ltd. Electronic Materials Research Laboratories 635, Sasakura, Fuchu-machi, Toyama-sh, Toyama 53, 〒9392753, JP)
丸山 大輔 (〒53 富山県富山市婦中町笹倉６３５ 日産化学工業株式会社 電子材料研究所内 Toyama, 〒9392753, JP)
日産化学工業株式会社 (〒54 東京都千代田区神田錦町３丁目７番地１ Tokyo, 〒1010054, JP)
MARUYAMA, Daisuke (Ltd. Electronic Materials Research Laboratories 635, Sasakura, Fuchu-machi, Toyama-sh, Toyama 53, 〒9392753, JP)
丸山 大輔 (〒53 富山県富山市婦中町笹倉６３５ 日産化学工業株式会社 電子材料研究所内 Toyama, 〒9392753, JP)
International Classes:
G03F7/40; H01L21/027; H01L21/3065; G03F7/40; H01L21/02
Attorney, Agent or Firm:
HANABUSA, Tsuneo et al. (Shin-Ochanomizu Urban Trinity 2, Kandasurugadai 3-chom, Chiyoda-ku Tokyo 62, 〒1010062, JP)
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