Title:
COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM HAVING CYCLIC DIESTER GROUP
Document Type and Number:
WIPO Patent Application WO/2014/098076
Kind Code:
A1
Abstract:
[Problem] To provide a resist underlayer film which can be used as a hard mask. [Solution] A resist underlayer film-forming composition for lithography, which contains, as silanes, hydrolyzable silanes, hydrolysis products thereof or hydrolysis-condensation products thereof, and wherein the hydrolyzable silanes include a hydrolyzable silane represented by formula (1) or a combination of a hydrolyzable silane represented by formula (1) and a hydrolyzable silane represented by formula (2), with the hydrolyzable silane represented by formula (1) or the combination of a hydrolyzable silane represented by formula (1) and a hydrolyzable silane represented by formula (2) being contained in an amount of less than 50% by mole of all the silanes. R1
aR2
bSi(R3)4-(a+b) formula (1) (In formula (1), R1 represents an organic group containing a moiety represented by formula (1-1), formula (1-2) or formula (1-3); a represents an integer of 1; b represents an integer of 0 or 1; and (a + b) represents an integer of 1 or 2.) R4
aR5
bSi(R6)4-(a+b) formula (2) (In formula (2), R4 represents an organic group containing a moiety represented by formula (2-1), formula (2-2) or formula (2-3); a represents an integer of 1; b represents an integer of 0 or 1; and (a + b) represents an integer of 1 or 2.)
Inventors:
KANNO YUTA (JP)
SAKUMA DAISUKE (JP)
TAKASE KENJI (JP)
NAKAJIMA MAKOTO (JP)
SHIGAKI SHUHEI (JP)
SAKUMA DAISUKE (JP)
TAKASE KENJI (JP)
NAKAJIMA MAKOTO (JP)
SHIGAKI SHUHEI (JP)
Application Number:
PCT/JP2013/083740
Publication Date:
June 26, 2014
Filing Date:
December 17, 2013
Export Citation:
Assignee:
NISSAN CHEMICAL IND LTD (JP)
International Classes:
G03F7/11; C07F7/04; C07F7/18; C08G77/14; C08G77/26; C08G77/28; G03F7/26; H01L21/027
Domestic Patent References:
| WO2011033965A1 | 2011-03-24 | |||
| WO2011102470A1 | 2011-08-25 |
Foreign References:
| JP2010085912A | 2010-04-15 | |||
| JP2010085878A | 2010-04-15 | |||
| JP2009244722A | 2009-10-22 | |||
| JP2009282524A | 2009-12-03 |
Attorney, Agent or Firm:
HANABUSA, Tsuneo et al. (JP)
Sepal Tsuneo (JP)
Sepal Tsuneo (JP)
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