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Title:
COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM
Document Type and Number:
WIPO Patent Application WO/2024/063044
Kind Code:
A1
Abstract:
A composition for forming a silicon-containing resist underlayer film, the composition containing: polysiloxane as component [A]; an aromatic iodine compound as component [B]; and a solvent as component [C].

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Inventors:
TAKEDA SATOSHI (JP)
SHIBAYAMA WATARU (JP)
Application Number:
PCT/JP2023/033871
Publication Date:
March 28, 2024
Filing Date:
September 19, 2023
Export Citation:
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Assignee:
NISSAN CHEMICAL CORP (JP)
International Classes:
G03F7/11; G03F7/20
Foreign References:
JP2021051292A2021-04-01
JP2020184062A2020-11-12
JP2018159921A2018-10-11
Attorney, Agent or Firm:
TAKAOKA Ryoichi et al. (JP)
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