COMPOSITION FOR GLASS AND CERAMIC POLISHING

Title:

COMPOSITION FOR GLASS AND CERAMIC POLISHING

Document Type and Number:

WIPO Patent Application WO/2016/199672

Kind Code:

A1

Abstract:

[Problem] To provide a composition for glass and ceramic polishing, which has excellent applicability to CMP polishing, while being composed of polishing material particles having a uniform particle size, thereby having no concerns about the occurrence of deformation or change of properties, and which is capable of stably exhibiting excellent polishing characteristics and is not susceptible to polishing scratches, thereby enabling the achievement of a good smooth surface having less surface defects, while being capable of meeting wide polishing conditions from an acidic region to an alkaline region. [Solution] A composition for glass and ceramic polishing, which is characterized by containing, as a polishing material, titanium oxide particles, at least a part of the surfaces of which is covered with silicon dioxide.

Inventors:

UEDA MASATOSHI (JP)
TSURUMURA TATSUYA (JP)

Application Number:

PCT/JP2016/066428

Publication Date:

December 15, 2016

Filing Date:

June 02, 2016

Export Citation:

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Assignee:

TAYCA CORP (JP)

International Classes:

C09K3/14; B24B37/00

Domestic Patent References:

WO2013175976A1	2013-11-28
WO2001055028A1	2001-08-02

Foreign References:

JP2006511638A	2006-04-06
JP2015000877A	2015-01-05
JP2010506743A	2010-03-04
JP2009509784A	2009-03-12
JP2001294848A	2001-10-23
JP2009078935A	2009-04-16
JP2013136499A	2013-07-11

Other References: