Title:
COMPOSITION FOR HARD COATING LAYER FORMATION, HARD COATING FILM, ARTICLE WITH HARD COATING FILM, IMAGE DISPLAY DEVICE, AND METHOD FOR MANUFACTURING HARD COATING FILM
Document Type and Number:
WIPO Patent Application WO/2021/193478
Kind Code:
A1
Abstract:
The present invention is provided with a composition for hard coating layer formation, a hard coating film including a hard coating layer formed of the composition for hard coating layer formation, an article and an image display device with the hard coating film each, and a method for manufacturing the hard coating film. The composition for hard coating layer formation contains a polyorganosilsesquioxane that includes a building block (a) having a group including a perfluoropolyether group, and a building block (b) having a group including a reactive group selected from the group consisting of a cationically polymerizable group and a radically polymerizable group. The proportion of the content of the building block (b) to the total building blocks is no more than 30 mass% and less than 100 mass% in terms of mass.
Inventors:
TAMURA AKIO (JP)
FUKUSHIMA YUTA (JP)
MATSUMOTO AYAKO (JP)
FUKUSHIMA YUTA (JP)
MATSUMOTO AYAKO (JP)
Application Number:
PCT/JP2021/011551
Publication Date:
September 30, 2021
Filing Date:
March 19, 2021
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
G02B1/14; B32B27/00; C08G59/20; C08G77/24; C09D4/00; C09D5/00; C09D183/08
Domestic Patent References:
| WO2014069634A1 | 2014-05-08 | |||
| WO2008038714A1 | 2008-04-03 | |||
| WO2019235072A1 | 2019-12-12 | |||
| WO2020235383A1 | 2020-11-26 |
Foreign References:
| JP2014205739A | 2014-10-30 | |||
| JP2019203069A | 2019-11-28 | |||
| JP2015221888A | 2015-12-10 | |||
| JP2019203077A | 2019-11-28 | |||
| JP2006047504A | 2006-02-16 | |||
| US20090256287A1 | 2009-10-15 |
Attorney, Agent or Firm:
KOH-EI PATENT FIRM, P.C. (JP)
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