Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
COMPOSITION FOR HARD MASK
Document Type and Number:
WIPO Patent Application WO/2019/093757
Kind Code:
A1
Abstract:
Embodiments of the present invention provide a composition for a hard mask, the composition comprising: a polymer of a first aromatic unit containing a plurality of aryl rings and a second aromatic unit containing a cyano group; and a solvent, wherein the composition is capable of forming a hard mask having both improved etching resistance and solubility.

Inventors:
CHOI, Sang Jun (13-1102, 29 Gwangnaru-ro 56-gil,,Gwangjin-gu, Seoul, 05119, KR)
LEE, Eun Sang (310-301, 24 Baeul 2-ro,,Yuseong-gu, Daejeon, 34022, KR)
YANG, Don Sik (502-301, 35 Gobong-ro 34-gil,,Iksan-si, Jeollabuk-do, 54544, KR)
CHOI, Han Young (302-402, 33 Segyogongwon-ro,,Pyeongtaek-si, Gyeonggi-do, 17834, KR)
Application Number:
KR2018/013466
Publication Date:
May 16, 2019
Filing Date:
November 07, 2018
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
DONGWOO FINE-CHEM CO., LTD. (132 Yakchon-ro, Iksan-si, Jeollabuk-do, 54631, KR)
CHOI, Sang Jun (13-1102, 29 Gwangnaru-ro 56-gil,,Gwangjin-gu, Seoul, 05119, KR)
International Classes:
G03F7/004; C08G61/02; C08G61/12; C08L65/00
Attorney, Agent or Firm:
DOOHO IP LAW FIRM (7th Floor, 1 Gangnam-daero 51-gil,,Seocho-gu, Seoul, 06628, KR)
Download PDF: