Title:
COMPOSITION FOR HARD MASK
Document Type and Number:
WIPO Patent Application WO/2019/093757
Kind Code:
A1
Abstract:
Embodiments of the present invention provide a composition for a hard mask, the composition comprising: a polymer of a first aromatic unit containing a plurality of aryl rings and a second aromatic unit containing a cyano group; and a solvent, wherein the composition is capable of forming a hard mask having both improved etching resistance and solubility.
Inventors:
CHOI SANG JUN (KR)
LEE EUN SANG (KR)
YANG DON SIK (KR)
CHOI HAN YOUNG (KR)
LEE EUN SANG (KR)
YANG DON SIK (KR)
CHOI HAN YOUNG (KR)
Application Number:
PCT/KR2018/013466
Publication Date:
May 16, 2019
Filing Date:
November 07, 2018
Export Citation:
Assignee:
DONGWOO FINE CHEM CO LTD (KR)
CHOI SANG JUN (KR)
CHOI SANG JUN (KR)
International Classes:
G03F7/004; C08G61/02; C08G61/12; C08L65/00
Foreign References:
| US20170198096A1 | 2017-07-13 | |||
| KR20150052861A | 2015-05-14 | |||
| KR20130130005A | 2013-11-29 | |||
| KR20150079199A | 2015-07-08 | |||
| KR20160112847A | 2016-09-28 |
Attorney, Agent or Firm:
DOOHO IP LAW FIRM (KR)
Download PDF:
Previous Patent: ELECTRONIC DEVICE COMPRISING SENSING PANEL
Next Patent: APPARATUS FOR MANUFACTURING ELECTROLYTIC COPPER FOIL
Next Patent: APPARATUS FOR MANUFACTURING ELECTROLYTIC COPPER FOIL