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Patent Searching and Data


Title:
COMPOSITION FOR HARD MASK
Document Type and Number:
WIPO Patent Application WO/2019/143107
Kind Code:
A1
Abstract:
The present invention provides a composition for a hard mask, comprising: a polymer of a compound having a predetermined structure comprising an ether group; and a solvent. A hard mask having improved etching resistance, solubility, and flatness can be produced from the composition for a hard mask.

Inventors:
CHOI HAN YOUNG (KR)
YANG DON SIK (KR)
LEE EUN SANG (KR)
Application Number:
PCT/KR2019/000610
Publication Date:
July 25, 2019
Filing Date:
January 15, 2019
Export Citation:
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Assignee:
DONGWOO FINE CHEM CO LTD (KR)
International Classes:
G03F7/11; C08G61/12; C08G65/34
Foreign References:
KR20100080148A2010-07-08
KR20170078503A2017-07-07
KR20150131867A2015-11-25
KR20170008038A2017-01-23
KR20170067356A2017-06-16
Attorney, Agent or Firm:
LEECHAE INTELLECTUAL PROPERTY (KR)
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