Title:
COMPOSITION FOR HARD MASK
Document Type and Number:
WIPO Patent Application WO/2019/143121
Kind Code:
A1
Abstract:
The present invention provides a composition, for a hard mask, comprising a solvent and polymer represented by a particular chemical formula. A hard mask having enhanced etch resistance, solubility and smoothness can be formed from the composition for a hard mask.
Inventors:
CHOI HAN YOUNG (KR)
YANG DON SIK (KR)
LEE EUN SANG (KR)
YANG DON SIK (KR)
LEE EUN SANG (KR)
Application Number:
PCT/KR2019/000637
Publication Date:
July 25, 2019
Filing Date:
January 16, 2019
Export Citation:
Assignee:
DONGWOO FINE CHEM CO LTD (KR)
International Classes:
G03F7/11; C08F216/14; C08G65/34; G03F7/004
Foreign References:
| KR20150136106A | 2015-12-04 | |||
| KR20170062395A | 2017-06-07 | |||
| KR20150069557A | 2015-06-23 | |||
| KR20110001215A | 2011-01-06 | |||
| KR20170118273A | 2017-10-25 |
Attorney, Agent or Firm:
LEECHAE INTELLECTUAL PROPERTY (KR)
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