Title:
COMPOSITION, INFRARED PASS FILTER AND METHOD FOR FABRICATING SAME, AND INFRARED SENSOR
Document Type and Number:
WIPO Patent Application WO/2014/084147
Kind Code:
A1
Abstract:
Provided is a composition whereby it is possible to form an infrared pass filter which even when extremely thin (for example, a thickness of 1µm) is able to pass infrared beams (particularly near-infrared beams) therethrough with little noise originating from visible light components. The composition is configured such that when a film with a thickness of 1µm is formed, the maximum value of light transmissibility in the thickness direction of the film is in a range of wavelengths of 400-750nm is 20% or less and the minimum value of light transmissibility in the thickness direction of the film in a range of wavelengths of 900-1300nm is 90% or more. Also provided are an infrared pass filter, a method for manufacturing said infrared pass filter, and an infrared sensor, which employ said composition.
Inventors:
TAKISHITA HIROTAKA (JP)
KUGE TOSHIHITO (JP)
TAGUCHI YOSHINORI (JP)
TAGUCHI HIROSHI (JP)
KUGE TOSHIHITO (JP)
TAGUCHI YOSHINORI (JP)
TAGUCHI HIROSHI (JP)
Application Number:
PCT/JP2013/081560
Publication Date:
June 05, 2014
Filing Date:
November 22, 2013
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
G02B5/20; C08F2/50; G02B5/26; G03F7/004; G03F7/031; G03F7/033
Foreign References:
| JPH093311A | 1997-01-07 | |||
| JPH06194516A | 1994-07-15 | |||
| JPS6318302A | 1988-01-26 | |||
| JPH0333173A | 1991-02-13 | |||
| JP2012082317A | 2012-04-26 | |||
| JP2003215326A | 2003-07-30 | |||
| JP2003287620A | 2003-10-10 | |||
| JP2001075054A | 2001-03-23 |
Attorney, Agent or Firm:
TAKAMATSU Takeshi et al. (JP)
Takamatsu 猛 (JP)
Takamatsu 猛 (JP)
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