COMPOSITION, METHOD FOR MANUFACTURING FILM, METHOD FOR MANUFACTURING NEAR-INFRARED CUT FILTER, METHOD FOR MANUFACTURING SOLID-STATE IMAGING ELEMENT, METHOD FOR MANUFACTURING IMAGE DISPLAY DEVICE, AND METHOD FOR MANUFACTURING INFRARED SENSOR

Title:

Document Type and Number:

WIPO Patent Application WO/2018/047584

Kind Code:

A1

Abstract:

Provided are a composition having good heat resistance and which is capable of forming a film in which fluctuation in spectral characteristics in the near-infrared region is suppressed even when humidity conditions during application vary, as well as a film, a near-infrared cut filter, a solid-state imaging element, an image display device, and a method for manufacturing an infrared sensor. The composition includes a near-infrared absorbing compound A having a π-conjugate plane including a monocyclic or condensed aromatic ring, and a solvent B, the solvent B including a solvent B1 for which the solubility parameter thereof is in the range of 19.9 MPa0.5 to 22.3 MPa0.5, and a solvent B2 for which the solubility parameter thereof is less than 19.9 Pa0.5 or exceeds 22.3 MPa0.5, and the content of the solvent B2 in the solvent B being no greater than 9% by mass.

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Inventors:

KITAJIMA SHUNSUKE (JP)

Application Number:

PCT/JP2017/029339

Publication Date:

March 15, 2018

Filing Date:

August 15, 2017

Export Citation:

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Assignee:

FUJIFILM CORP (JP)

International Classes:

G02B5/22; C09K3/00; G03F7/004; G03F7/027; H01L27/144; H01L27/146

Domestic Patent References:

WO2016136784A1

2016-09-01

Foreign References:

JP2008138194A	2008-06-19
JP2016020496A	2016-02-04
JP2014149506A	2014-08-21
JP2015227466A	2015-12-17
JP2015200881A	2015-11-12
JP2015011095A	2015-01-19
US20160178818A1	2016-06-23

Attorney, Agent or Firm:

NAKASHIMA Junko et al. (JP)

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