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Title:
COMPOSITION FOR MODEL MATERIAL
Document Type and Number:
WIPO Patent Application WO/2019/176144
Kind Code:
A1
Abstract:
The present invention pertains to a model material composition that is for forming a model material by material-jetting stereolithography, that comprises a polymerizable monomer, a photopolymerization initiator, and a silicone-modified urethane oligomer containing a polymerizable group, and that has a viscosity of 20-500 mPa·s at 25°C.

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Inventors:
NISHIMOTO TOMOHISA (JP)
KUBO SATOSHI (JP)
Application Number:
PCT/JP2018/034068
Publication Date:
September 19, 2019
Filing Date:
September 13, 2018
Export Citation:
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Assignee:
MAXELL HOLDINGS LTD (JP)
International Classes:
B29C64/112; B29C64/40; B33Y10/00; B33Y70/00; C08F290/00
Domestic Patent References:
WO2017047693A12017-03-23
Foreign References:
JPH0485314A1992-03-18
JP2015208904A2015-11-24
JP2001311917A2001-11-09
Attorney, Agent or Firm:
YAMAO, Norihito et al. (JP)
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