Title:
COMPOSITION FOR OPTICAL STEREOLITHOGRAPHY, STEREOLITHOGRAPHIC OBJECT, AND PRODUCTION METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2020/066047
Kind Code:
A1
Abstract:
Provided is a composition that is for optical stereolithography and that allows quicker completion of optical stereolithography (optical curing) to provide a stereolithographic object having a superior strength (e.g., a strength that prevents occurrence of a crack, etc., when impacted or dropped, and a strength that resists repetitive bending). The composition for optical stereolithography according to the present invention comprises (A) a diallylcycloalkane polymer having a carbon ring having 3-8 carbon atoms, (B) a radically polymerizable compound having a methacryl group and/or an acryl group, (C) a radical polymerization initiator, and (D) a sensitizer, wherein the composition contains, as (B), at least (B1) an epoxy (meth)acrylate having a methacryl group and/or an acryl group, or (B2) a dioxane (meth)acrylate having a methacryl group and/or an acryl group, and contains 0.5-10 mass% of (A), 5-43 mass% of (B1) and (B2), 20-95 mass% of (B) excluding (B1) and (B2), 0.1-5 mass% of (C), and 0.1-5 mass% of (D).
Inventors:
OKAMOTO HIROAKI (JP)
NAKATSUKA MASARO (JP)
NAKATSUKA MASARO (JP)
Application Number:
PCT/JP2019/001476
Publication Date:
April 02, 2020
Filing Date:
January 18, 2019
Export Citation:
Assignee:
OKAMOTO CHEMICAL IND CO LTD (JP)
International Classes:
C08F290/12; B29C64/124; B33Y10/00; B33Y70/00; B33Y80/00; C08F2/50; C08F263/06
Domestic Patent References:
| WO2016125661A1 | 2016-08-11 | |||
| WO2019039185A1 | 2019-02-28 |
Foreign References:
| JPH01131223A | 1989-05-24 | |||
| JP2008001795A | 2008-01-10 | |||
| JP2004109851A | 2004-04-08 | |||
| JP2001310916A | 2001-11-06 | |||
| JP2010260917A | 2010-11-18 | |||
| JPH0673145A | 1994-03-15 | |||
| JP2003012782A | 2003-01-15 |
Attorney, Agent or Firm:
OKUYAMA, Shoichi et al. (JP)
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