Title:
COMPOSITION FOR PATTERN FORMATION AND PATTERN FORMING MATERIAL, AND PATTERN FORMING APPARATUS AND PATTERN FORMING METHOD
Document Type and Number:
WIPO Patent Application WO/2006/051761
Kind Code:
A1
Abstract:
This invention provides, e.g., a composition for pattern formation that has good sensitivity and resolution, can provide a high definition pattern and, at the same time, is excellent in adhesion to substrates such as substrates for printed wiring formation, and can provide a good pattern shape after pattern formation. The composition for pattern formation comprises a chain transfer compound having a plurality of chain transferable substituents, a polymerization inhibitor, a binder, a polymerizable compound, and a photopolymerization initiator. In the composition for pattern formation, preferably, for example, the chain transferable substituent is a mercapto group.
Inventors:
YOSHIMURA KOUSAKU (JP)
SATO MORIMASA (JP)
MATSUMOTO HIROTAKA (JP)
SATO MORIMASA (JP)
MATSUMOTO HIROTAKA (JP)
Application Number:
PCT/JP2005/020391
Publication Date:
May 18, 2006
Filing Date:
November 07, 2005
Export Citation:
Assignee:
FUJI PHOTO FILM CO LTD (JP)
YOSHIMURA KOUSAKU (JP)
SATO MORIMASA (JP)
MATSUMOTO HIROTAKA (JP)
YOSHIMURA KOUSAKU (JP)
SATO MORIMASA (JP)
MATSUMOTO HIROTAKA (JP)
International Classes:
G03F7/004; C08F2/38; G03F7/031
Foreign References:
JP2002220409A | 2002-08-09 | |||
JP2002317005A | 2002-10-31 | |||
JP2000162767A | 2000-06-16 | |||
JPS6462634A | 1989-03-09 | |||
JP2004001244A | 2004-01-08 | |||
JPH11149154A | 1999-06-02 |
Attorney, Agent or Firm:
Hirota, Koichi (NAGARE & ASSOCIATES 4th Floor, Shinjuku TR
Bldg., 2-2-13, Yoyog, Shibuya-ku Tokyo 53, JP)
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