Title:
COMPOSITION FOR PHOTOCURABLE IMPRINT, AND METHOD FOR FORMATION OF PATTERN USING THE COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2012/002413
Kind Code:
A1
Abstract:
Disclosed is a composition for a photocurable imprint, which has good pattern transferring properties and good mold (pattern formation surface) release properties regardless of the type of a polymerizable monomer contained therein, and therefore can form a pattern having excellent shape with high repeatability; and a method for forming a pattern on a substrate by optical imprinting, which uses the composition. The composition for a photocurable imprint comprises (A) a polymerizable monomer having a (meth)acrylic group, (B) a photopolymerization initiator, and (C) a hyperbranch polymer produced by polymerizing a polymerizable monomer having a (meth)acrylic group. Preferably, the composition contains 0.1-10 parts by mass of the photopolymerization initiator (B) and 0.1-10 parts by mass of the hyperbranche polymer (C) relative to 100 parts by mass of the polymerizable monomer (A).
Inventors:
UMEKAWA Hideki (1-1 Mikage-cho, Shunan-sh, Yamaguchi 48, 〒7458648, JP)
梅川 秀喜 (〒48 山口県周南市御影町１－１ 株式会社トクヤマ内 Yamaguchi, 〒7458648, JP)
梅川 秀喜 (〒48 山口県周南市御影町１－１ 株式会社トクヤマ内 Yamaguchi, 〒7458648, JP)
Application Number:
JP2011/064868
Publication Date:
January 05, 2012
Filing Date:
June 29, 2011
Export Citation:
Assignee:
TOKUYAMA CORPORATION (1-1 Mikage-cho, Shunan-shi Yamaguchi, 48, 〒7458648, JP)
株式会社トクヤマ (〒48 山口県周南市御影町１－１ Yamaguchi, 〒7458648, JP)
UMEKAWA Hideki (1-1 Mikage-cho, Shunan-sh, Yamaguchi 48, 〒7458648, JP)
株式会社トクヤマ (〒48 山口県周南市御影町１－１ Yamaguchi, 〒7458648, JP)
UMEKAWA Hideki (1-1 Mikage-cho, Shunan-sh, Yamaguchi 48, 〒7458648, JP)
International Classes:
H01L21/027; B29C59/02; G03F7/20
Attorney, Agent or Firm:
TAKEZAWA Soichi et al. (First Kowa Bldg, 15-5 Shimbashi 1-chome, Minato-k, Tokyo 04, 〒1050004, JP)
Claims: