Title:
COMPOSITION FOR PHOTOCURABLE IMPRINT, AND METHOD FOR FORMATION OF PATTERN USING THE COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2012/002413
Kind Code:
A1
Abstract:
Disclosed is a composition for a photocurable imprint, which has good pattern transferring properties and good mold (pattern formation surface) release properties regardless of the type of a polymerizable monomer contained therein, and therefore can form a pattern having excellent shape with high repeatability; and a method for forming a pattern on a substrate by optical imprinting, which uses the composition. The composition for a photocurable imprint comprises (A) a polymerizable monomer having a (meth)acrylic group, (B) a photopolymerization initiator, and (C) a hyperbranch polymer produced by polymerizing a polymerizable monomer having a (meth)acrylic group. Preferably, the composition contains 0.1-10 parts by mass of the photopolymerization initiator (B) and 0.1-10 parts by mass of the hyperbranche polymer (C) relative to 100 parts by mass of the polymerizable monomer (A).
Inventors:
UMEKAWA HIDEKI (JP)
KAWABATA YUICHIRO (JP)
KAWABATA YUICHIRO (JP)
Application Number:
PCT/JP2011/064868
Publication Date:
January 05, 2012
Filing Date:
June 29, 2011
Export Citation:
Assignee:
TOKUYAMA CORP (JP)
UMEKAWA HIDEKI (JP)
KAWABATA YUICHIRO (JP)
UMEKAWA HIDEKI (JP)
KAWABATA YUICHIRO (JP)
International Classes:
H01L21/027; B29C59/02; G03F7/20
Domestic Patent References:
| WO2010137724A1 | 2010-12-02 |
Foreign References:
| JP2010031238A | 2010-02-12 | |||
| JP2007526820A | 2007-09-20 | |||
| JP2007524519A | 2007-08-30 | |||
| JP2010284970A | 2010-12-24 |
Attorney, Agent or Firm:
TAKEZAWA Soichi et al. (JP)
Soichi Takezawa (JP)
Soichi Takezawa (JP)
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Claims: