Title:
COMPOSITION FOR POLISHING GALLIUM OXIDE SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2020/067057
Kind Code:
A1
Abstract:
The present invention provides: a polishing composition which enables the achievement of high polishing rate and high surface quality with respect to polishing of a gallium oxide substrate; and a polishing method and a production method of a gallium oxide substrate, each of which uses this polishing composition.
The disclosed technology provides a polishing composition which is used for polishing of a gallium oxide substrate. This polishing composition contains abrasive grains and water. By performing polishing with use of this polishing composition, the polishing rate of a gallium oxide substrate is improved and a gallium oxide substrate that has good surface quality is able to be achieved.
Inventors:
HIRAKO SACHIKO (JP)
NOGUCHI NAOTO (JP)
NOGUCHI NAOTO (JP)
Application Number:
PCT/JP2019/037362
Publication Date:
April 02, 2020
Filing Date:
September 24, 2019
Export Citation:
Assignee:
FUJIMI INC (JP)
International Classes:
H01L21/304; B24B37/00; C09G1/02; C09K3/14
Foreign References:
| JP2016094510A | 2016-05-26 | |||
| JP2014000641A | 2014-01-09 | |||
| JP2008105883A | 2008-05-08 | |||
| JP2018185526A | 2018-11-22 | |||
| JP2019062384A | 2019-04-18 |
Other References:
See also references of EP 3859768A4
Attorney, Agent or Firm:
ABE, Makoto (JP)
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