Title:
COMPOSITION FOR PRODUCING ORGANIC ANTI-REFLECTIVE FILM HAVING HIGH ETCH RATE
Document Type and Number:
WIPO Patent Application WO/2018/226016
Kind Code:
A1
Abstract:
Disclosed are a composition for producing an organic anti-reflective film which has an anti-reflective function, is useful in simplification of processes, is excellent in a pattern profile, and has a high etch rate, and a production method therefor. The composition for producing an organic anti-reflective film comprises: an anti-reflective polymer comprising repeating units represented by chemical formula 1-1, chemical formula 1-2, and chemical formula 1-3 below; an isocyanurate compound comprising at least one portion represented by chemical formula 2 below; and an organic solvent which dissolves the aforementioned ingredients.
Inventors:
NOH HYO JUNG (KR)
KIM JI HYUN (KR)
KIM SEUNG JIN (KR)
KIM HYUN JIN (KR)
KIM JI HYUN (KR)
KIM SEUNG JIN (KR)
KIM HYUN JIN (KR)
Application Number:
PCT/KR2018/006407
Publication Date:
December 13, 2018
Filing Date:
June 05, 2018
Export Citation:
Assignee:
DONGJIN SEMICHEM CO LTD (KR)
International Classes:
G03F7/09; C09D175/06; G03F7/004; G03F7/11
Foreign References:
| KR100945435B1 | 2010-03-05 | |||
| KR101710415B1 | 2017-02-27 | |||
| KR20090049406A | 2009-05-18 | |||
| KR20140085123A | 2014-07-07 | |||
| KR20170136189A | 2017-12-11 |
Attorney, Agent or Firm:
SHINWOO PATENT & LAW FIRM (KR)
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