Title:
COMPOSITION FOR PRODUCTION OF CONTACT, CONTACT USING SAME AND PROCESS FOR PRODUCTION OF CONTACT
Document Type and Number:
WIPO Patent Application WO/2013/088752
Kind Code:
A1
Abstract:
Provided are: a composition for the production of a contact, said composition being capable of yielding a versatile contact permitting a low stroke; and so on. This composition for the production of a contact comprises both a nickel-cobalt alloy having a cobalt content of 1 to less than 20wt% and 0.002 to 0.1 part by weight of sulfur relative to 100 parts by weight of the alloy, and has an average grain diameter of 0.07 to 0.35μm.
Inventors:
ISHIKAWA YOKO
MAEZAWA KUNIYOSHI
MAEZAWA KUNIYOSHI
Application Number:
PCT/JP2012/056478
Publication Date:
June 20, 2013
Filing Date:
March 13, 2012
Export Citation:
Assignee:
OMRON TATEISI ELECTRONICS CO (JP)
ISHIKAWA YOKO
MAEZAWA KUNIYOSHI
ISHIKAWA YOKO
MAEZAWA KUNIYOSHI
International Classes:
C25D1/00; C22C19/03; H01R13/03; H01R13/24; H01R43/00
Domestic Patent References:
| WO2011111639A1 | 2011-09-15 |
Foreign References:
| JP2008078061A | 2008-04-03 | |||
| JPH10197562A | 1998-07-31 |
Attorney, Agent or Firm:
MASUI, Yoshihisa et al. (JP)
Yoshihisa Masui (JP)
Yoshihisa Masui (JP)
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Claims: