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Patent Searching and Data


Title:
COMPOSITION, PRODUCTION METHOD FOR COMPOSITION, AND PRODUCTION METHOD FOR UNSATURATED COMPOUND
Document Type and Number:
WIPO Patent Application WO/2020/040048
Kind Code:
A1
Abstract:
This composition includes a compound (A) represented by general formula (1) and a compound (B) represented by general formula (2), wherein the contained amount of the compound (B) is 0.00002-0.2 parts by mass with respect to 100 parts by mass of the compound (A). (1): (R1-COO)n-R2-(NCO)m (In formula (1), R1 represents an ethylenically unsaturated group having 2-7 carbon atoms, R2 represents an (m+n)-valent hydrocarbon group having 1-7 carbon atoms, and n and m each represent an integer of one or two.) (In formula (2), R represents (-R2-(OCO-R1), and R1 and R2 are identical to those in formula (1).)

Inventors:
NISHIMURA NORIHITO (JP)
OHNO KATSUTOSHI (JP)
Application Number:
PCT/JP2019/032117
Publication Date:
February 27, 2020
Filing Date:
August 16, 2019
Export Citation:
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Assignee:
SHOWA DENKO KK (JP)
International Classes:
C07C265/04; C07C231/10; C07C233/18; C07C263/10; C07C263/20; C07C269/02; C07C271/16; C07C271/60; C07C333/04; C07D231/12; C08G18/81; C07B61/00
Domestic Patent References:
WO2018070541A12018-04-19
WO2008143207A12008-11-27
WO2011074503A12011-06-23
Foreign References:
JPH11228523A1999-08-24
JP2016150922A2016-08-22
JP2007055993A2007-03-08
JP4823546B22011-11-24
JP2018154147A2018-10-04
US2821544A1958-01-28
JPH06322051A1994-11-22
JPH06187822A1994-07-08
JPS60234582A1985-11-21
JPS60234583A1985-11-21
JPH06184256A1994-07-05
JP4273531B22009-06-03
JPS4823546B11973-07-14
JP2007008828A2007-01-18
Other References:
"CMC Technical Library", April 2005, CMC PUBLISHING CO., LTD., article "Degradation Mechanism and Stabilization Technology of Polymer", pages: 168
See also references of EP 3842417A4
Attorney, Agent or Firm:
OIKAWA Shu et al. (JP)
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