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Title:
COMPOSITION PRODUCTION METHOD AND COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2020/218619
Kind Code:
A1
Abstract:
Provided is a composition production method characterized by comprising a step A for performing ultrafiltration, precise filtration, or a dialysis membrane treatment, or a combination thereof on a composition containing water and a fluoropolymer, wherein the fluoropolymer is a polymer including a structural unit M3 derived from a monomer represented by general formula (1): CX2=CY(-CZ2-O-Rf-A) (in the formula, each X is the same or different and represents -H or -F, Y represents -H, -F, an alkyl group, or a fluorine-including alkyl group, each Z is the same or different and represents -H, -F, an alkyl group, or a fluoroalkyl group, Rf is a fluorine-including alkylene group having 1-40 carbon atoms or a fluorine-including alkylene group having 2-100 carbon atoms and having an ether bond, A represents -COOM, -SO3M, -OSO3M, or -C(CF3)2OM (M represents -H, a metal atom, -NR7 4, an imidazolium optionally having a substituent, a pyridinium optionally having a substituent, or a phosphonium optionally having a substituent, and R7 represents H or an organic group), and at least one of X, Y, and Z includes a fluorine atom).

Inventors:
HIGASHI MASAHIRO (JP)
ISHIHARA SUMI (JP)
YONEDA SATORU (JP)
KISHIKAWA YOSUKE (JP)
AOYAMA HIROKAZU (JP)
Application Number:
PCT/JP2020/018041
Publication Date:
October 29, 2020
Filing Date:
April 27, 2020
Export Citation:
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Assignee:
DAIKIN IND LTD (JP)
International Classes:
C08F6/06; B01D61/14; B01D61/24; B01D69/00; C02F1/44; C08F6/12; C08F14/18; C08F16/24; C08L27/12; C08L29/10; C09D5/00; C09D127/12; C09D129/10
Domestic Patent References:
WO2017038827A12017-03-09
Foreign References:
JP2001226436A2001-08-21
JP2009102490A2009-05-14
JP2004075979A2004-03-11
JP2012511606A2012-05-24
JP2017025242A2017-02-02
JPH08333421A1996-12-17
JP2004075979A2004-03-11
JP2009122700A2009-06-04
Other References:
See also references of EP 3960775A4
Attorney, Agent or Firm:
TOKOSHIE PATENT FIRM (JP)
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