COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION INCLUDING POLYMER CONTAINING POLYCYCLIC AROMATIC

Title:

COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION INCLUDING POLYMER CONTAINING POLYCYCLIC AROMATIC

Document Type and Number:

WIPO Patent Application WO/2023/106364

Kind Code:

A1

Abstract:

A resist underlayer film which is a burned coating film from a composition for resist underlayer film formation, wherein the composition for resist underlayer film formation includes a polymer having a unit structure (A) having a polycyclic aromatic hydrocarbon structure and/or a unit structure (B) derived from a maleimide structure. The resist underlayer film has a film thickness less than 10 nm.

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Inventors:

MIZUOCHI RYUTA (JP)
OGATA HIROTO (JP)
TAMURA MAMORU (JP)

Application Number:

PCT/JP2022/045268

Publication Date:

June 15, 2023

Filing Date:

December 08, 2022

Export Citation:

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Assignee:

NISSAN CHEMICAL CORP (JP)

International Classes:

G03F7/11; C08F12/00; C08F26/06; G03F7/20

Foreign References:

JP2009098639A	2009-05-07
JP2013073125A	2013-04-22
JP2009534710A	2009-09-24

Attorney, Agent or Firm:

TAKAOKA Ryoichi et al. (JP)

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